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Dose-dependent clozapine-induced skin picking and self-injurious behaviour in treatment-resistant schizophrenia

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dc.contributor.author Rathnayake, L.C.
dc.contributor.author Chandradasa, M.
dc.contributor.author Mendis, J.
dc.date.accessioned 2024-01-19T04:41:22Z
dc.date.available 2024-01-19T04:41:22Z
dc.date.issued 2020
dc.identifier.citation Sri Lanka Journal of Medicine.2020;29(1):35-38 en_US
dc.identifier.issn 2579-1990
dc.identifier.uri http://repository.kln.ac.lk/handle/123456789/27395
dc.description Not Indexed en_US
dc.description.abstract Clozapine is a second-generation antipsychotic used for treatment-resistant schizophrenia. Obsessive-compulsive symptoms induced by clozapine is a known entity. Skin-picking is closely related to obsessions and excoriation disorder is now categorised under obsessive-compulsive and related disorders. Skin-picking associated with clozapine dose increments has been reported in a young male from India. Apart from this, skin-picking and self-injurious behaviour associated with clozapine use are not well described in the literature. Here we report a young Sri Lankan male with treatment-resistant schizophrenia presenting with self-injurious behaviour that is related to clozapine-induced compulsive skin-picking. Due to the partial response, clozapine dose of the described patient was increased above 550 mg/day. Skin-picking was seen only above this dose and the addition of risperidone helped to resolve the psychotic symptoms and keep the clozapine dose at the previous level. The current report is unique in the sense that the self-injurious behaviour was associated with clozapine dose increments. en_US
dc.language.iso en en_US
dc.publisher The Kandy Society of Medicine en_US
dc.subject Obsessive-compulsive disorder en_US
dc.subject Self-injurious behaviour en_US
dc.subject Skin-picking en_US
dc.subject Clozapine en_US
dc.subject Sri Lanka en_US
dc.title Dose-dependent clozapine-induced skin picking and self-injurious behaviour in treatment-resistant schizophrenia en_US
dc.type Article en_US


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