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Spectral responses of electrodeposited cuprous oxide thin film electrodes

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dc.contributor.author Siripala W en_US
dc.date.accessioned 2014-11-19T04:45:50Z
dc.date.available 2014-11-19T04:45:50Z
dc.date.issued 1995
dc.identifier.uri http://repository.kln.ac.lk/handle/123456789/4082
dc.description.abstract Photoresponse of the electrodeposited cuprous oxide thin film electrodes were investigated in a photoelectrochemical cell. Spectral response measurements reveal that a Schottky-type junction is formed at the junction between the substrate and cuprous oxide resulting in n-type and p-type photosignals in a photoelectrochemical cell. The electrodeposited cuprous oxide is an n-type semiconductor. en_US
dc.publisher Journal of the National Science Council of Sri Lanka en_US
dc.subject Cuprous oxide en_US
dc.subject Electrodeposition en_US
dc.subject Photoelectrochemistry en_US
dc.subject Photoresponse en_US
dc.title Spectral responses of electrodeposited cuprous oxide thin film electrodes
dc.type article en_US
dc.identifier.department Physics en_US


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