Please use this identifier to cite or link to this item: http://repository.kln.ac.lk/handle/123456789/9954
Title: Applied magnetic field and stress induced anisotropy dependence of energy for oriented ferromagnetic thick films
Authors: Samarasekara, P.
Keywords: Magnetic thin films
ferromagnetism
Heisenberg Hamiltonian
stress induced anisotropy and spin
Issue Date: 2008
Publisher: University of Kelaniya
Citation: Samarasekara, P. 2008. Applied magnetic field and stress induced anisotropy dependence of energy for oriented ferromagnetic thick films. Journal of Science, University of Kelaniya, Sri Lanka, 4: 01-10.
Abstract: The energy of perfectly oriented thick ferromagnetic films at different applied magnetic field and stress was studied using classical model of Heisenberg Hamiltonian. For the values of parameters used in this report, the energy required to orient the film with 1000 layers in 41.4° or 57.6° directions becomes minimum at applied magnetic fields of ω Hout = 4.8 or ω Hin = 4.8, respectively. The film can be easily oriented in 172° direction by applying the external stress ω Ks = 3.6 perpendicular to the film plane, for the values of parameters used in this report. These final results mainly depend on the values of other parameters used for calculations. The energy becomes minimum and maximum at almost the same values of oriented angle (θ), in plane magnetic field, out of plane magnetic field and stress for both sc(001) and bcc(001 lattice types. But the values of energies corresponding to maxima and minima are slightly different for the sc(001) and bcc(001) lattices.
URI: http://www.kln.ac.lk/science/web/journals/vol4/Journal_4-1.pdf
http://repository.kln.ac.lk/handle/123456789/9954
Appears in Collections:Volume 04 - 2008

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