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dc.contributor.authorSiripala Wen_US
dc.date.accessioned2014-11-19T04:45:50Z-
dc.date.available2014-11-19T04:45:50Z-
dc.date.issued1995-
dc.identifier.urihttp://repository.kln.ac.lk/handle/123456789/4082-
dc.description.abstractPhotoresponse of the electrodeposited cuprous oxide thin film electrodes were investigated in a photoelectrochemical cell. Spectral response measurements reveal that a Schottky-type junction is formed at the junction between the substrate and cuprous oxide resulting in n-type and p-type photosignals in a photoelectrochemical cell. The electrodeposited cuprous oxide is an n-type semiconductor.en_US
dc.publisherJournal of the National Science Council of Sri Lankaen_US
dc.subjectCuprous oxideen_US
dc.subjectElectrodepositionen_US
dc.subjectPhotoelectrochemistryen_US
dc.subjectPhotoresponseen_US
dc.titleSpectral responses of electrodeposited cuprous oxide thin film electrodes-
dc.typearticleen_US
dc.identifier.departmentPhysicsen_US
Appears in Collections:Physics

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