A Photoelectrochemical Investigation of n- and p-type semi�conducting behaviour of Copper Oxide Films

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Date

1989

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Semiconductor Science and Technology

Abstract

Copper(I) oxide films were prepared on copper substrates by exposing them to solutions containing Cu2+ ions, and it was observed that the photoresponse of these films electrodes in a photoelectrochemical cell is both n- and p-type. However, it was observed that the n-type behaviour of these film electrodes could be enhanced and the p-type behaviour could be reduced by adjusting the pH of the solution in which the oxide films had been prepared. The simultaneous existence of spatially separated n- and p-type regions in the Cu2O film is suggested as the possible reason for these observations. The anodic oxidation of copper was considered to be the origin of the p-type regions while the n-type regions were considered to be the result of the cathodic deposition of Cu2O.

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Copper, Oxide; Photoelectrochemistry; Copper oxide films

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