IV characteristics of ITO/Cu2O/ metal junctions
dc.contributor.author | Perera, L.D.R.D. | en_US |
dc.contributor.author | Siripala, W. | en_US |
dc.contributor.author | Kalingamudali, S.R.D. | en_US |
dc.contributor.author | Jayanetti, J.K.D.S. | en_US |
dc.contributor.author | de Silva, K.T.L. | en_US |
dc.date.accessioned | 2014-11-19T04:45:36Z | |
dc.date.available | 2014-11-19T04:45:36Z | |
dc.date.issued | 1996 | |
dc.description.abstract | Cuprous oxide is an inexpensive and non-toxic semiconductor material having the potential for use in low-cost photovoltaic devices. Electrodeposition is a low-cost method t0 produce thin Cu2O films and electrodeposited CU2O has been reported to be n-type, In order to investigate the possibility of using electrodeposited Cu2O in solar cells, Cu2O/metal junctions were studied using their I-V characteristics. Thin films of Cu20 were electrodeposited on Indium tin oxide (ITO) coated glass substrate using an aqueous solution of cupric acetate. Electrodeposition was carried out under potentiostatic condition of -250 mV vs SCE at 55"C for a period of 1 h. These Cu20 samples were used to make junctions with Al, Hg,Cu, Ag and Au. The I-V plots of these junctions were obtained in dark and when illuminated. The I-V characteristics of the Cu2O/Hg junction show good rectifying properties.The plots for the junction in dark and under illumination indicate that the electrodeposited Cu2O behaves as an n-type semiconductor. The I-V profile fits into the standard diode equation with I0 = 2.8 x 10 -10 A, ideality factor n=0.48 and series resistance Rs = 40U. Also, the Junction exhibits a contact potential of about 150 mV. | en_US |
dc.identifier.department | Physics | en_US |
dc.identifier.uri | http://repository.kln.ac.lk/handle/123456789/4066 | |
dc.subject | Photoelectrochemical cell | en_US |
dc.subject | Characterisation | en_US |
dc.subject | ZnSe | en_US |
dc.subject | Copper Indium Sulphide | en_US |
dc.subject | Thin Film Electrodes; Kalinga | en_US |
dc.title | IV characteristics of ITO/Cu2O/ metal junctions | |
dc.type | conference_item | en_US |
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