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Applied magnetic field and stress induced anisotropy dependence of energy for oriented ferromagnetic thick films

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dc.contributor.author Samarasekara, P.
dc.date.accessioned 2015-10-06T06:08:44Z
dc.date.available 2015-10-06T06:08:44Z
dc.date.issued 2008
dc.identifier.citation Samarasekara, P. 2008. Applied magnetic field and stress induced anisotropy dependence of energy for oriented ferromagnetic thick films. Journal of Science, University of Kelaniya, Sri Lanka, 4: 01-10. en_US
dc.identifier.uri
dc.identifier.uri http://repository.kln.ac.lk/handle/123456789/9954
dc.description.abstract The energy of perfectly oriented thick ferromagnetic films at different applied magnetic field and stress was studied using classical model of Heisenberg Hamiltonian. For the values of parameters used in this report, the energy required to orient the film with 1000 layers in 41.4° or 57.6° directions becomes minimum at applied magnetic fields of ω Hout = 4.8 or ω Hin = 4.8, respectively. The film can be easily oriented in 172° direction by applying the external stress ω Ks = 3.6 perpendicular to the film plane, for the values of parameters used in this report. These final results mainly depend on the values of other parameters used for calculations. The energy becomes minimum and maximum at almost the same values of oriented angle (θ), in plane magnetic field, out of plane magnetic field and stress for both sc(001) and bcc(001 lattice types. But the values of energies corresponding to maxima and minima are slightly different for the sc(001) and bcc(001) lattices. en_US
dc.language.iso en en_US
dc.publisher University of Kelaniya en_US
dc.subject Magnetic thin films en_US
dc.subject ferromagnetism en_US
dc.subject Heisenberg Hamiltonian en_US
dc.subject stress induced anisotropy and spin en_US
dc.title Applied magnetic field and stress induced anisotropy dependence of energy for oriented ferromagnetic thick films en_US
dc.type Article en_US


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