n-type electrical conductivity in cuprous oxide thin films

dc.contributor.author	Siripala, W.
dc.contributor.author	Kumara, K.P.
dc.date.accessioned	2015-09-14T04:14:55Z
dc.date.available	2015-09-14T04:14:55Z
dc.date.issued	1988
dc.identifier.citation	Siripala, W. and Kumara, K.P. 1988. n-type electrical conductivity in cuprous oxide thin films. Journal of National Science Council, Sri Lanka, 16(1): 125-129.	en_US
dc.identifier.issn	0300-9254
dc.identifier.uri	http://repository.kln.ac.lk/handle/123456789/9538
dc.description.abstract	Electrodeposited cuprous oxide thin films were investigated to determine whether their electrical conductivity is n-type or p-type. The experimental results based on the measurements of thermoelectric e.m.f, sheet resistance, dark and light current-voltage characteristics of Cu2O/CuxS and Cu2O/CuCNS heterojunctions reveal that the electrodeposited cuprous oxide films produce n-type electrical conductivity. These observations are in very good agreement with the previously reported n-type behavior of the electro-deposited Cu2O film electrodes in a photo-electrochemical cell.
dc.language.iso	en	en_US
dc.publisher	Natural Resources, Energy and Science Authority of Sri Lanka	en_US
dc.title	n-type electrical conductivity in cuprous oxide thin films	en_US
dc.type	Article	en_US