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Observation of Defect Interface States at the Cu2O/CuxS Junction Using Thermally Stimulated IV Measurements.

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dc.contributor.author Kalingamudali, S.R.D. en_US
dc.contributor.author Siripala, W. en_US
dc.date.accessioned 2014-11-19T04:46:57Z
dc.date.available 2014-11-19T04:46:57Z
dc.date.issued 2001
dc.identifier.issn 1391-5880 en_US
dc.identifier.uri http://repository.kln.ac.lk/jspui/handle/123456789/4145
dc.description.abstract A simple method was developed to fabricate a Cu2O/CuxS p-n junction diode and I-V characteristics of the diode was measured at various temperatures. It was revealed that there are current transport mechanisms at the junction which are leading to high leakage currents. Namely, an oscillatory behaviour of the current with the temperature was observed under reverse bias conditions. This behaviour was interpreted as the thermally enhanced tunnelling at the junction due to the existence of defect interface states. We believe that proper surface treatment might reduce the density of interface states, and thereby improve the I-V characteristics of the diode. en_US
dc.publisher Sri Lankan Journal of Physics en_US
dc.subject Interfaces (Physical Sciences); Thermal analysis; Thermal analysis- Measurement; Simulation methods; Kalinga en_US
dc.title Observation of Defect Interface States at the Cu2O/CuxS Junction Using Thermally Stimulated IV Measurements.
dc.type article en_US
dc.identifier.department Physics en_US


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