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Electrodeposition of p-type, n-type and p-n Homojunction Cuprous Oxide Thin Films

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dc.contributor.author Jayathileke, K.M.D.C. en_US
dc.contributor.author Siripala, W. en_US
dc.contributor.author Jayanetti, J.K.D.S. en_US
dc.date.accessioned 2014-11-19T04:44:41Z
dc.date.available 2014-11-19T04:44:41Z
dc.date.issued 2008
dc.identifier.issn 1391-5880 en_US
dc.identifier.uri http://repository.kln.ac.lk/handle/123456789/3992
dc.description.abstract Potentiostatic electrodeposition of cuprous oxide (Cu2O) thin films in aqueous acetate baths was investigated to study the conduction type, n-type or p-type, and the p-n homojunction formation of the films, using photocurrent spectral response and capacitance-voltage measurements to determine the conduction type. The study reveals that not only the pH value but also the cupric ion concentration of the acetate bath determines the conduction type of the films. Electrodeposition of p-n homojunction of Cu2O is possible with a single or a two step electrodeposition. Both parameters of the deposition bath, pH and cupric ion concentration, can be adjusted to control conduction type and p-n homojunction formation of Cu2O films. en_US
dc.publisher Sri Lankan Journal of Physics en_US
dc.subject cuprous oxide; electrodeposition; n- and p-type; spectral response; p-n homojunction en_US
dc.title Electrodeposition of p-type, n-type and p-n Homojunction Cuprous Oxide Thin Films
dc.type article en_US
dc.identifier.department Physics en_US


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