Physics

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    Growth and Characterization of Copper Indium Diselenide
    (Proceedings of the Technical Session of Institute of Physics, Sri Lanka, 1996) Chithrani, B.D.; de Silva, K.T.L.; Jayanetti, J.K.D.S.; Siripala, W.
    CuInSe2 thin films were prepared on Ti plates by electrodeposition from an aqueous solution containing CuCl2, InCl3 and SeO2. The deposition was carried out at -0.5V Vs SCE. X-ray diffraction and Scanning electron microscopy have been used to study the crystallographic and morphological properties of the samples. Effects of annealing in air have also been monitored. Apparent bulk structure changes have been observed during annealing. Annealing of films at 350 0C was found to result in the formation of CuInSe2 films having a chalcopyrite structure, indicating that the samples are of good quality.
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    Study of Annealing Effects of Cuprous Oxide Grown by Electrodepostion Technique
    (Solar Energy Materials and Solar Cells, 1996) Siripala, W.; Perera, L.D.R.D.; de Silva, K.T.L.; Jayanetti, J.K.D.S.; Dharmadasa, I.M.
    Low temperature electrochemical deposition of cuprous oxide from aqueous solutions has been investigated. X-ray diffraction, scanning electron microscopy, optical absorption, and photo-response of liquid/cuprous oxide junctions have been used to study the deposits' crystallographic, morphological, optical, and electrical properties. Effects of annealing in air have been studied using the above mentioned methods. As-deposited cuprous oxide exhibits a direct band gap of 2.0 eV, and shows an n-type behaviour when used in an liquid/solid junction. Annealing below 300�C enhances the n-type photocurrent produced by the junction. Type conversion occurs after heat treatments in air at temperatures above 300�C. No apparent bulk structure changes have been observed during annealing below this temperature, but heat treatments above this temperature produce darker films containing cupric oxide and its complexes with water.